안녕하세요. 아래와 같이 도쿄대학교의 토리우미 교수님을 모시고 7월 18일 오후 4시에  초청세미나를 개최하오니 관심 있는 분들의 많은 참석 부탁드립니다. 

○초청연사 : Akira Toriumi (The University of Tokyo, Japan)

 ○주제 : Advanced Gate Stacks from Materials Perspective 

 ○일시 : 2014년 7월 18일(금) 오후 4:00 

 ○장소 : 자연과학캠퍼스 제2종합연구동 83188호 (김영진 첨단강의실)
 
○문의 : SAINT 행정실 (031-299-4190) 


■ Speaker : Akira Toriumi (The University of Tokyo, Japan)

■ Title: Advanced Gate Stacks from Materials Perspective 

■ Time: July. 18.(Fri). 16:00 

■ Place : Room 83188, 2nd Research Building, Sungkyunkwan University 

■Contact : SAINT OFFICE (031-299-4190) 


-Seminar Abstract-

The gate stack technology has been the heart of CMOS devices. Si/SiO2 system has been used in microelectronics for a long time. A number of new materials, however, have recently been introduced, and Si/SiO2 is not only the practical interface to be investigated but other systems should be carefully examined. Above all, high-k gate stacks have changed the CMOS device technology trend very much. 
Furthermore, new channel materials are also actively now under consideration. In this lecture, we will discuss key points in Si, Ge and graphene gate stacks from materials perspective.